- About Us
Andrew V. Teplyakov, Professor
(b. 1970), B.S., 1992, Moscow State University; M.S., 1993, Ph.D., 1997, Columbia University; Postdoctoral Fellow, 1997 – 1998, New York University
Our research program focuses on the interdisciplinary area of experimental surface chemistry. The beauty of this discipline is in its links with analytical, organic, and inorganic chemistry. Using the techniques and methods of physical chemistry, my group solves various problems related to chemistry and properties of well-ordered surfaces and thin-and ultra-thin films. Our group is using modern analytical techniques and computational methods to understand these complex processes on a molecular level. Vibrational spectroscopies, high-energy electron spectroscopies, mass spectrometry, and X-ray spectroscopies are used in my laboratory on campus as well as at the National Synchrotron Light Source at Brookhaven National Laboratory, Upton, NY. The results of experimental investigation are compared with (and are sometimes based on) the Density Functional Theory studies and chemometric methods are used for data mining.
Current research projects include formation, structure and properties of multilayer (sandwich) systems used in modern microelectronics, where a layer of metal (Al or Cu) is separated from a semiconductor substrate by a thin diffusion barrier material. Although these films are mostly amorphous, the specific reactive sites on their surfaces can be analyzed spectroscopically and computationally and their reactivity can be tuned chemically as shown in Figure 1.
In fact, our unique approach has already allowed us to examine the possible mechanisms of impurity introduction and distribution in diffusion barriers. We are also interested in the origins of ordering within monolayers and in thin films and how one can manipulate the experimental conditions to govern these processes. An unusual and extremely sensitive vibrational spectroscopy setup allows us to follow very small concentrations of various chemical groups both on a surface and within each layer as well as at each interface of such systems. Combined with computational investigation and with microscopic characterization of these systems, our efforts are directed towards tuning chemical properties of surfaces, as illustrated, for example, in Figure 2 for chemical effects of the surface itself on a reactivity of a functional group attached to it.
Other projects are focused on metallic and semiconductor nanostructures, carbon-based materials and solar cells, and on DNA-based interfaces with semiconductor materials for biosensing applications.
- J. C. F. Rodríguez-Reyes and A. V. Teplyakov "Cooperative nitrogen insertion processes: Thermal transformation of NH3 on a Si(100) surface," Phys. Rev. B, (2007) 76, 075348-1-075348-16.
- J. C. F. Rodríguez-Reyes and A. V. Teplyakov "Chemistry of organometallic compounds on silicon: The first step in film growth," Chemistry-A European Journal, (2007) 13, 9164-9176.
- T. R. Leftwich, M. R. Madachik and A. V. Teplyakov "Dehydrative cyclocondensation reactions on hydrogen-terminated Si(100) and Si(111): An ex situ tool for the modification of semiconductor surfaces," J. Am. Chem. Soc., (2008) 130, 16216-16223.
- T. R. Leftwich and A. V. Teplyakov "Chemical Manipulation of Multifunctional Hydrocarbons on Silicon Surfaces," Surf. Sci. Rep., (2008) 63, 1-71.
- X. Zhang and A. V. Teplyakov "Adsorption of C60 Buckminster fullerenes on an 11-amino-1-undecene covered Si(111) substrate," Langmuir, (2008) 24, 810-820.
- X. Zhang, S. Kumar, J. Chen and A. V. Teplyakov "Covalent attachment of DNA molecules on amine-functionalized Si(111) surface," Surf. Sci., (2009) 603, 2445-2475.
- K. A. Perrine and A. V. Teplyakov "Metallic nanostructure formation limited by the surface hydrogen on silicon," Langmuir, (2010) 26(15), 12648–12658.
- K. A. Perrine and A. V. Teplyakov "Reactivity of Selectively Terminated Single Crystal Silicon Surfaces,"
Chem. Soc. Rev., (2010) 39, 3256 – 3274.
- S. F. Bent, J. S. Kachian, J. C. F. Rodríguez-Reyes, and A. V. Teplyakov "Tuning the reactivity of semiconductor surfaces by functionalization with amines of different basicity," PNAS, (2011) 108(3), 956 – 960.