Andrew V. Teplyakov, Professor
University of Delaware
112 Lammot DuPont Laboratory
Newark, DE 19716
(b. 1970), B.S., 1992, Moscow State University; M.S., 1993, Ph.D., 1997, Columbia University; Postdoctoral Fellow, 1997 – 1998, New York University
Our research program focuses on surface and interface science. The beauty of this discipline is in its links with analytical, organic, and inorganic chemistry. Using the techniques and methods of physical chemistry, we solve problems related to chemical transformations of organic and organometallic compounds on semiconductors, thin solid film growth and etching, nanostructure and nanomaterial formation. We study these processes at the molecular level with vibrational spectroscopies, high-energy electron spectroscopies, mass spectrometry, X-ray spectroscopies, microscopic techniques and supplement these experimental studies with computational investigations
Current research projects include chemical modification of semiconductor surfaces to tune their physical (band alignment and bending, charge carrier properties) and chemical (functionalization, passivation) properties to adjust those to a specific application. The goal of this research direction is to develop new strategies for manipulating the surface properties of semiconductor materials in a controlled way. The findings of these investigations will be relevant for future applications in molecular and nanoelectronics, sensing, and solar energy conversion.
We are also interested in covalent attachment of large molecules and nanoparticles to surfaces to yield novel interfaces, thin films, and materials. We have used C60 Buckminster fullerenes and their derivatives as well as carbon nanotubes as spectroscopic and microscopic probes to establish the covalent nature of their binding to appropriately terminated self-assembled monolayers on silicon. More recently, we have also investigated the possibility of designing new approaches to layer-by-layer growth of nanoparticle thin films leading to exceptionally high coverages based on covalent attachment rather than self-assembly.
Other projects include metalorganic reactions for controlled deposition and atomic layer etching (layer-by-layer removal of metals from thin films), deposition of thin solid films used as hard coatings, and multivariate curve resolution of complex thermal desorption data.
Liu, Y., Williams, M. G. Miller, T., and Teplyakov, A. V. Nanoparticle Layer Deposition for Highly Controlled Multilayer Formation Based on High-Coverage Monolayers of Nanoparticles.
Thin Solid Films
Duan, Y., Pirolli, L., and Teplyakov, A. V. Investigation of the H2S Poisoning Process for Sensing Composite Material Based on Carbon Nanotubes and Metal Oxides.
Sensors and Actuators B,
Kung, H. and Teplyakov, A. V. Selectivity and Mechanism of Thermal Decomposition of β-diketones on ZnO Powder.
Bent, S. F. and Teplyakov, A. V. Semiconductor Surface Functionalization for Advances in Electronics, Energy Conversion, and Dynamic Systems.
J. Vac. Sci Technol. A,
Invited Review Article for the Special AVS 60th Anniversary Issue, awarded top 20 most downloaded articles in JVST.
Tian, F. and Teplyakov, A. V. Silicon Surface Functionalization Targeting Si-N Linkages.
2013, 29(1), 13-28.
Invited Feature Article, Image featured on the cover of the journal.
Tian, F., Taber, D. F. and Teplyakov, A. V. –NH- Termination on Si(111) Surface by Wet Chemistry.
J. Am. Chem. Soc.
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